JPH0362261B2 - - Google Patents

Info

Publication number
JPH0362261B2
JPH0362261B2 JP18299383A JP18299383A JPH0362261B2 JP H0362261 B2 JPH0362261 B2 JP H0362261B2 JP 18299383 A JP18299383 A JP 18299383A JP 18299383 A JP18299383 A JP 18299383A JP H0362261 B2 JPH0362261 B2 JP H0362261B2
Authority
JP
Japan
Prior art keywords
adhesive
pellicle
mask substrate
mask
pellicle frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18299383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6075835A (ja
Inventor
Fumio Mizuno
Nobuhiro Ootsuka
Shigehiko Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58182993A priority Critical patent/JPS6075835A/ja
Publication of JPS6075835A publication Critical patent/JPS6075835A/ja
Publication of JPH0362261B2 publication Critical patent/JPH0362261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58182993A 1983-10-03 1983-10-03 ペリクル Granted JPS6075835A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58182993A JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58182993A JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6075692A Division JPH07175206A (ja) 1994-04-14 1994-04-14 ペリクル

Publications (2)

Publication Number Publication Date
JPS6075835A JPS6075835A (ja) 1985-04-30
JPH0362261B2 true JPH0362261B2 (en]) 1991-09-25

Family

ID=16127873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58182993A Granted JPS6075835A (ja) 1983-10-03 1983-10-03 ペリクル

Country Status (1)

Country Link
JP (1) JPS6075835A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284047U (en]) * 1985-11-13 1987-05-28
JPS62156957U (en]) * 1986-03-25 1987-10-05
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JPH0278945U (en]) * 1988-12-07 1990-06-18
JP2599460B2 (ja) * 1989-06-16 1997-04-09 松下電子工業株式会社 フォトマスク
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
JPH09204038A (ja) * 1996-09-24 1997-08-05 Hitachi Ltd マスクの製造方法
US6153060A (en) * 1999-08-04 2000-11-28 Honeywell International Inc. Sputtering process
CN1198316C (zh) * 2000-12-27 2005-04-20 三井化学株式会社 薄膜
JP4979088B2 (ja) * 2008-05-14 2012-07-18 信越化学工業株式会社 半導体リソグラフィー用ペリクル
WO2010026938A1 (ja) * 2008-09-08 2010-03-11 電気化学工業株式会社 半導体製品の製造方法
JP6303286B2 (ja) * 2013-04-30 2018-04-04 凸版印刷株式会社 ペリクル付きフォトマスクの検査方法及びペリクル粘着耐久性検査装置
US10353283B2 (en) * 2016-07-11 2019-07-16 Shin-Etsu Chemical Co., Ltd. Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicle

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108277A (ja) * 2010-11-17 2012-06-07 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル

Also Published As

Publication number Publication date
JPS6075835A (ja) 1985-04-30

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees